Figure 4. a) Co-ZIF@rGO-F-25在电流密度0.1 A g−1时恒流充放电曲线;b) Co-ZIF纳米片、Co-ZIF@rGO-P、Co-ZIF@rGO-F-25在0.1 A g−1电流密度下的循环性能;c) Co-ZIF@rGO-F-25在不同电流密度下的恒电流充放电曲线;d) Co-ZIF纳米片,Co-ZIF@rGO-P,Co-ZIF@rGO-F-25的倍率性能。
Figure 5. a) Co-ZIF纳米片,Co-ZIF@rGO-P, Co-ZIF@rGO-F-25在较高电流密度为1 A g−1时的长期循环性能;循环测试后Co-ZIF@rGO-F-25负极的b) TEM图像,c) XRD谱; d) Co-ZIF @rGO-F-25中Co-ZIF纳米片的平面间距的示意图。
相关研究成果于2019年由华东师范大学Chengzhong Yu课题组,发表在Advanced Science (https://doi.org/10.1002/advs.201901480)上。原文:A General Approach to Direct Growth of Oriented Metal–Organic Framework Nanosheets on Reduced Graphene Oxides